The electrical properties of CeO2-Nd2O3 thin film that deposited by using unbalanced magnetron sputtering method have been studied. These properties characterized in metal-oxide-semiconductor (MOS) modeled which is formed by Si/CeO2-Nd2O3/Al. Scanning electron microscope (SEM) and energy dispersive x-ray spectroscope (EDX) is used to know more about the surface morphology of the film and its atom composition. The electrical properties measured by using current-voltage-meter (IV-meter) and impedance spectroscopy. The investigation included the relationship between defect and the conduction processes in the thin film. The equivalent circuit model and the parameters values of the circuit from the impedance spectra are also discussed.
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