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Deposisi film tipis NdBa2Cu3O7-d dengan metode DC unbalaced magnetron sputtering dari target stoikiometri

Proceeding from JBPTITBPP / 2007-02-14 18:47:03
Oleh : Togar Saragi, Lab. of Electronic Material Physics /Physics Dept. - ITB (fismatel@melsa.net.id)
Dibuat : 2001-06-19, dengan file

Keyword : Superconductors, NBCO, unbalanced dc magnetron sputtering

NdBa2Cu3O7-d thin films have been grown on MgO (100) substrates by dc unbalanced magnetron sputtering. Sputtering target were obtained by a standard solid state reaction. The applied discharge power was varied from 42 up to 61 W with the substrate temperatures of 700o C. The x-ray diffraction pattern showed that the deposited thin film were grown along c-axis. The full width at half maximum (FWHM) of the (102)/(110) peak for the target and the (006) peak for NBCO#B and NBCO#C films are 0.41o, 0.31o and 0.32o respectively. The SEM and electron dipersion analysis for x-ray (EDAX) showed that this thin film have a homogeneous grain with a-nonstoichiometric composition.

Deskripsi Alternatif :

NdBa2Cu3O7-d thin films have been grown on MgO (100) substrates by dc unbalanced magnetron sputtering. Sputtering target were obtained by a standard solid state reaction. The applied discharge power was varied from 42 up to 61 W with the substrate temperatures of 700o C. The x-ray diffraction pattern showed that the deposited thin film were grown along c-axis. The full width at half maximum (FWHM) of the (102)/(110) peak for the target and the (006) peak for NBCO#B and NBCO#C films are 0.41o, 0.31o and 0.32o respectively. The SEM and electron dipersion analysis for x-ray (EDAX) showed that this thin film have a homogeneous grain with a-nonstoichiometric composition.

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